Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions
Tag: Manual revert |
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* Exposure: 100 kV (JEOL 9500) | * Exposure: 100 kV (JEOL 9500) | ||
* Development: AR 300-46 for 90 seconds | * Development: AR 300-46 for 90 seconds | ||
* Stopper: | * Stopper: DI for 30 seconds + blow dry with nitrogen | ||