Specific Process Knowledge/Lithography/Strip: Difference between revisions
| Line 239: | Line 239: | ||
<br clear="all" /> | <br clear="all" /> | ||
[[File: | [[File:PA_gas_mix_fullBoat_v2.png|320px|thumb|Ashing rate as function of gas mix ratio when processing a full boat of 25 100 mm wafers.|right]] | ||
Test using a boat of 25 100 mm wafers in the center of the process chamber shows that | Test using a boat of 25 100 mm wafers in the center of the process chamber shows that <30% nitrogen gives the highest ashing rate. | ||
<b>Test parameters:</b><br> | <b>Test parameters:</b><br> | ||