Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions
| Line 9: | Line 9: | ||
* Time: 60 s | * Time: 60 s | ||
* Baking temperature: 85C | * Baking temperature: 85C | ||
* Baking time: | * Baking time: 60 s | ||
* Exposure: 100 kV (JEOL 9500) | * Exposure: 100 kV (JEOL 9500) | ||
* Development: AR 300-46 for 90 seconds | * Development: AR 300-46 for 90 seconds | ||