Specific Process Knowledge/Lithography/Strip: Difference between revisions
Appearance
| Line 256: | Line 256: | ||
==Process gas flow rate for plasma asher 4 & 5== | ==Process gas flow rate for plasma asher 4 & 5== | ||
[[File: | [[File:PA_flowRate_v3.png|320px|thumb|Ashing rate as function of total gas flow rate.|right]] | ||
The ashing rate is related to the total gas flow rate during processing. | The ashing rate is related to the total gas flow rate during processing. | ||