Specific Process Knowledge/Lithography/Strip: Difference between revisions
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Typical process time for stripping in plasma asher 1 or 2: | Typical process time for stripping in plasma asher 1 or 2: | ||
*1.5 µm AZ 5214E resist film: ~15 min | *1.5 µm AZ 5214E resist film: ~15 min | ||
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'''NB: Use dedicated descum asher Plasma Asher 3: Descum for descumming.''' | '''NB: Use dedicated descum asher Plasma Asher 3: Descum for descumming.''' | ||
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==Plasma Asher 1== | ==Plasma Asher 1== | ||
<span style="color:red">Plasma asher 1 was decommissioned 2024-12-02.</span> | <span style="color:red">Plasma asher 1 was decommissioned 2024-12-02.</span> | ||