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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma_Asher_1|Plasma Asher 1]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma Asher 2|Plasma Asher 2]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma Asher 3: Descum|Plasma Asher 3: Descum]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma Asher 3: Descum|Plasma Asher 3: Descum]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma_Asher_4|Plasma Asher 4]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Plasma Asher 5|Plasma Asher 5]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Resist Strip|Resist strip]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Strip#Resist Strip|Resist strip]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific Process Knowledge/Lithography/LiftOff|Lift-off]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific Process Knowledge/Lithography/LiftOff|Lift-off]]</b>
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|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
All purposes
Resist descum
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Clean wafers only, no metal  
Clean wafers only, no metal  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Resist descum
All purposes
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Resist strip, no metal lift off
Resist strip, no metal lift off
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|style="background:LightGrey; color:black"|Process gasses
|style="background:LightGrey; color:black"|Process gasses
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*O<sub>2</sub> (0 - 400 sccm)
*O<sub>2</sub> (flow unknown)
*N<sub>2</sub>
*CF<sub>4</sub>
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*O<sub>2</sub> (0 - 400 sccm)
*O<sub>2</sub> (0-500 sccm)
*N<sub>2</sub>
*N<sub>2</sub> (0-500 sccm)
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*O<sub>2</sub> (flow unknown)
*O<sub>2</sub> (0-500 sccm)
*N<sub>2</sub> (0-500 sccm)
*CF<sub>4</sub> (0-200 sccm)
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*NA
*NA
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|style="background:LightGrey; color:black"|Max. process power
|style="background:LightGrey; color:black"|Max. process power
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1000 W
100 W (100%)
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1000 W
150-1000 W
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*100% (power unknown)
150-1000 W
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*NA
*NA
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*1 small sample
*1 small sample
*1 50 mm wafer
*1 50 mm wafer
*1 - 30 100 mm wafers
*1 100 mm wafer
*1 - 25 150 mm wafers
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1 small sample
*1 small sample
*1 50 mm wafer
*1 50 mm wafer
*1 - 30 100 mm wafers
*1-25 100 mm wafers
*1 - 25 150 mm wafers
*1-25 150 mm wafers
*1-25 200 mm wafers
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1 small sample
*1 small sample
*1 50 mm wafer
*1 50 mm wafer
*1 100 mm wafer
*1-25 100 mm wafers
*1-25 150 mm wafers
*1-25 200 mm wafers
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1 - 25 100 mm wafers
*1 - 25 100 mm wafers
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*Film or pattern of all but Type IV
*Film or pattern of all but Type IV
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
<b>No metal allowed!</b>
<b>No metals allowed! This includes metal oxides</b>
*Silicon, glass, and polymer substrates
*Silicon, glass, and polymer substrates
*Film or pattern of photoresist/polymer
*Film or pattern of photoresist/polymer
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Strip"