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| ==Plasma Asher 2== | | ==Plasma Asher 2== |
| [[Image:Plasma_Asher_6inch.jpg|300x300px|thumb|Plasma asher for removing AZ resist on 6" wafers: positioned in E-5]]
| | <span style="color:red">Plasma asher 2 was decommissioned 2024-12-02.</span> |
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| The Plasma Asher 2 is the same as Plasma Asher 1 but has another loading system which is more convenient for batch loading of 6inch substrates.
| | ===[[Specific Process Knowledge/Lithography/Descum/PlasmaAsher2|Information about decommissioned tool]]=== |
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| In this machine, only O2 and N2 gases are used for processes (in PlasmaAsher1, CF4 is used as well).
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| The typical process parameters when operating the equipment:
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| *Photeresist stripping
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| Pressure: 0.8 - 1.0 mbar
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| Gas: O2
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| Power: 600 - 1000 watts
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| Time: 5 -30 min., depending on photoresist type and thickness
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| A typical process time for stripping of 1.5 um AZ5214e resist is 25 min for 6 wafers load in a boat, recipe 18.
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| A Descum process in manual mode: O2:70, N2:70, power:150W, time:10 min
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| Be sure to wait for cooling if the mashine has been used at 1000W right before.
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| At a load at 2 Fused silica wafers resist removed 0.01-01,5um
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| The other materials have not been tested yet.
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| The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=200 LabManager] - '''requires login'''
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| ===Process Information=== | |
| *[[Specific Process Knowledge/Lithography/Descum|Descum]]
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| <!-- TARAN 220-03-05
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| ==III-V Plasma Asher==
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| [[Image:III-V_asher.jpg|300x300px|thumb|Plasma asher for removing resist on III-V samples: positioned in A-5]]
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| Diener Pico Plasma Asher for III-V materials.
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| The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=186 LabManager] - '''requires login'''
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| <br clear="all" />
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| -->
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| ==Plasma Asher 3: Descum== | | ==Plasma Asher 3: Descum== |
