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Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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AR-N 7520 New is a resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists.
=Contrast curve=
=Contrast curve=
* Coater: LabSpin 2
* Substrate: 2" Si
* Acceleration: 1000 RPM/s
* Speed: 4000 RPM
* Time: 60 s
* Baking temperature: 85C
* Baking time: 90 s
* Exposure: 100 kV (JEOL 9500)
* Development: AR 300-46 for 90 seconds
* Stopper: IPA for 30 seconds + blow dry with nitrogen
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