Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions
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|PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | |PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | ||
|C4F8DepDelay=0.3@5 |C4F8DepBoost= 0.5@50 |C4F8DepMain=200 | |C4F8DepDelay=0.3@5 |C4F8DepBoost= 0.5@50 |C4F8DepMain=200 | ||
|C4F8EtchDelay=0.5@100 |C4F8EtchBoost= |C4F8EtchMain=5 | |C4F8EtchDelay=0.5@ 100 |C4F8EtchBoost= |C4F8EtchMain=5 | ||
|SF6DepDelay=0.3@200 |SF6DepBoost=0.5@200 |SF6DepMain=15 | |SF6DepDelay=0.3@ 200 |SF6DepBoost=0.5@ 200 |SF6DepMain=15 | ||
|SF6EtchDelay=2@15 |SF6EtchBoost=0.3@100 |SF6EtchMain=200 | |SF6EtchDelay=2@ 15 |SF6EtchBoost=0.3@ 100 |SF6EtchMain=200 | ||
|O2Dep= |O2Etch= |ArDep=150 |ArEtch=150 | |O2Dep= |O2Etch= |ArDep=150 |ArEtch=150 | ||
|WCoilDep=2 |WCoilEtch=2 |WPlatenDep=1 | |WCoilDep=2 |WCoilEtch=2 |WPlatenDep=1 | ||
|WPlatenEtchDelay=1@1 |WPlatenEtchBoost=1@100 |WPlatenEtchMain=1 | |WPlatenEtchDelay=1@1 |WPlatenEtchBoost=1@ 100 |WPlatenEtchMain=1 | ||
|WClaritasDep= |WClaritasEtch= | |WClaritasDep= |WClaritasEtch= | ||
|%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | |%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | ||
| Line 43: | Line 43: | ||
|PressureDepDelay= |PressureDepBoost= |PressureDepMain=100% | |PressureDepDelay= |PressureDepBoost= |PressureDepMain=100% | ||
|PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | |PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | ||
|C4F8DepDelay=0.3@5 |C4F8DepBoost= 0.5@50 |C4F8DepMain=200 | |C4F8DepDelay=0.3 @5 |C4F8DepBoost= 0.5@ 50 |C4F8DepMain=200 | ||
|C4F8EtchDelay=0.5@100 |C4F8EtchBoost= |C4F8EtchMain=5 | |C4F8EtchDelay=0.5@ 100 |C4F8EtchBoost= |C4F8EtchMain=5 | ||
|SF6DepDelay=0.3@200 |SF6DepBoost=0.5@200 |SF6DepMain=15 | |SF6DepDelay=0.3@ 200 |SF6DepBoost=0.5@ 200 |SF6DepMain=15 | ||
|SF6EtchDelay=2@15 |SF6EtchBoost=0.3@100 |SF6EtchMain=200 | |SF6EtchDelay=2@ 15 |SF6EtchBoost=0.3@ 100 |SF6EtchMain=200 | ||
|O2Dep= |O2Etch= |ArDep=150 |ArEtch=150 | |O2Dep= |O2Etch= |ArDep=150 |ArEtch=150 | ||
|WCoilDep=2 |WCoilEtch=2 |WPlatenDep=1 | |WCoilDep=2 |WCoilEtch=2 |WPlatenDep=1 | ||
|WPlatenEtchDelay=1@1 |WPlatenEtchBoost=1@100 |WPlatenEtchMain=1 | |WPlatenEtchDelay=1@1 |WPlatenEtchBoost=1@ 100 |WPlatenEtchMain=1 | ||
|WClaritasDep= |WClaritasEtch= | |WClaritasDep= |WClaritasEtch= | ||
|%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | |%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | ||