Specific Process Knowledge/Wafer and sample drying: Difference between revisions
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== Spin dryer 5 == | == Spin dryer 5 == | ||
[[File:spinDryer_5. | [[File:spinDryer_5.jpg|640px|thumb|right]] | ||
Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame. | Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame. | ||