Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions
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!nano1.3 | !nano1.3 | ||
!nano1.21 | !nano1.21 | ||
!nano1.4 | |||
!nano1.41 | |||
|- | |- | ||
!C<sub>4</sub>F<sub>8</sub> (sccm) | !C<sub>4</sub>F<sub>8</sub> (sccm) | ||
| Line 12: | Line 14: | ||
|52 | |52 | ||
|52 | |52 | ||
|75 | |||
|75 | |||
|75 | |75 | ||
|- | |- | ||
!SF<sub>6</sub> (sccm) | !SF<sub>6</sub> (sccm) | ||
|38 | |||
|38 | |||
|38 | |38 | ||
|38 | |38 | ||
| Line 22: | Line 28: | ||
|- | |- | ||
!O<sub>2</sub> (sccm) | !O<sub>2</sub> (sccm) | ||
|0 | |||
|0 | |||
|0 | |0 | ||
|0 | |0 | ||
| Line 33: | Line 41: | ||
|800 (forward) | |800 (forward) | ||
|600 (forward) | |600 (forward) | ||
|800 (forward) | |||
|800 (forward) | |||
|800 (forward) | |800 (forward) | ||
|- | |- | ||
| Line 41: | Line 51: | ||
|40 | |40 | ||
|50 | |50 | ||
|50 | |||
|75 | |||
|- | |- | ||
! Pressure (mtorr) | ! Pressure (mtorr) | ||
|4 | |||
|4 | |||
|4 | |4 | ||
|4 | |4 | ||
| Line 55: | Line 69: | ||
| -10 | | -10 | ||
| -10 | | -10 | ||
| -20 | |||
| -20 | |||
|- | |- | ||
! Process time (s) | ! Process time (s) | ||
| Line 64: | Line 80: | ||
|- | |- | ||
! Nominal line width | ! Nominal line width | ||
! colspan=" | ! colspan="7" align="center"| Etched depths (nm) | ||
|- | |- | ||
! 30 nm | ! 30 nm | ||
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| Line 74: | Line 92: | ||
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!60 nm | !60 nm | ||
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| Line 81: | Line 101: | ||
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!90 nm | !90 nm | ||
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| Line 88: | Line 110: | ||
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!120 nm | !120 nm | ||
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| Line 95: | Line 119: | ||
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!150 nm | !150 nm | ||
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| Line 102: | Line 128: | ||
|- | |- | ||
! Nominal line width | ! Nominal line width | ||
! colspan=" | ! colspan="7" align="center"| Etch rates in trenches (nm/min) | ||
|- | |- | ||
!30 nm | !30 nm | ||
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| Line 112: | Line 140: | ||
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!60 nm | !60 nm | ||
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| Line 119: | Line 149: | ||
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!90 nm | !90 nm | ||
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| Line 126: | Line 158: | ||
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!120 nm | !120 nm | ||
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| Line 133: | Line 167: | ||
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!150 nm | !150 nm | ||
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| Line 154: | Line 190: | ||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12|Images]] | |[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12|Images]] | ||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano13|Images]] | |[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano13|Images]] | ||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/ | |[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano14|Images]] | ||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano141|Images]] | |||
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