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Specific Process Knowledge/Lithography/EBeamLithography/Cassettes: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 78: Line 78:
! Substrate size !! ID !! Slot ID !! Material !! Image !! Position indication !! Approximate offset [µm] !! PA to stage shift [µm]
! Substrate size !! ID !! Slot ID !! Material !! Image !! Position indication !! Approximate offset [µm] !! PA to stage shift [µm]
|-
|-
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|800px]] || [[image:BM4P-509 small.png|300px]]  
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|400px]] || [[image:BM4P-509 small.png|200px]]  


|| 3A: -810 µm
|| 3A: -810 µm
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