Specific Process Knowledge/Lithography/EBeamLithography/JEOL Compilation Computer: Difference between revisions

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 The JCC has two important differences from the JEOL 9500 exposure system:
-#Not all condition files found on the control computer will be present on the JCC. To get accurate meaningful calculations of shot time and execution time you should however keep the STDCUR at the intended beam current in the JDF file. Remember to change the CALPRM command when transfering the files to the JEOL 9500 system.
+#Not all condition files found on the control computer will be present on the JCC, in general we suggest you use "2na_ap4". To get accurate meaningful calculations of shot time and execution time you should however keep the STDCUR at the intended beam current in the JDF file. Remember to change the CALPRM command when transferring the files to the JEOL 9500 system.
 #The minimum shot time on the JCC is 10 ns, while it i  5 ns on the system itself. Thus for pre compilation on the JCC you must use a shot pitch high enough to satisfy that condition. The shot pitch does not affect the writing time estimate.
+#The JCC does not know the auto stocker, hence your SDF sequences must all ask for exposure on cassette #1, which is the default for a system without the auto stocker option.
 ==Troubleshooting==
 #If the console returns a "Can't open display" error when attempting to launch the EBX Menu, please restart the computer.
 #Any other issues, please notify [mailto:thope@dtu.dk Thomas Pedersen].