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File:WF 2E06 mar23B-030.jpg: Difference between revisions

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Etching of nanostructures in Si using DRIE-Pegasus: nano1.21 recipe, Run ID 1925, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -10 degs.
 
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
uploaded a new version of "Image:WF 2E06 mar23B-030.jpg": Etching of nanostructures in Si using DRIE-Pegasus: nano1.21 recipe, Run ID 1925, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -10 degs.
 
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