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Etching of nanostructures in Si using DRIE-Pegasus: nano1.21 recipe, Run ID 1925, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -10 degs.

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	10:24, 13 April 2011		1,024 × 768 (109 KB)	Jml (talk \| contribs)	Etching of nanostructures in Si using DRIE-Pegasus: nano1.21 recipe, Run ID 1925, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -10 degs.
	10:22, 13 April 2011		1,024 × 768 (88 KB)	Jml (talk \| contribs)	Etching of nanostructures in Si using DRIE-Pegasus: nano1.21 recipe, Run ID 1925, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -10 degs.

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