Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano13

The nano1.3 recipe

Recipe nano1.3

Recipe	Gas	C4F8 38 sccm, SF6 52 sccm
	Pressure	4 mTorr, Strike 3 secs @ 15 mTorr
	Power	600 W CP, 40 W PP
	Temperature	-10 degs
	Hardware	100 mm Spacers
	Time	60 secs (a) and 120 secs (b)
Conditions	Run ID	(a) 1856 and (b) 1856+1857
	Conditioning	Sequence: Oxygen clean, processes, no oxygen between runs
	Mask	211 nm zep etched down 117 nm

• The results of the nano1.3 recipe
• 
  The 30 nm trenches after 60 secs.
• 
  The 60 nm trenches after 60 secs.
• 
  The 90 nm trenches after 60 secs.
• 
  The 120 nm trenches after 60 secs.
• 
  The 150 nm trenches after 60 secs.
• 
  The 30 nm trenches after 120 secs.
• 
  The 60 nm trenches after 120 secs.
• 
  The 90 nm trenches after 120 secs.
• 
  The 120 nm trenches after 120 secs.
• 
  The 150 nm trenches after 120 secs.