Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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 [[image:SEM-Leo.jpg|200x200px|right|thumb|The Leo SEM has its own dedicated room: Cleanroom 9]]
-At the moment we have four SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.
+We have four SEM's at Danchip. Together they cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.
-The SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is a very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves. It is a standard high vacuum instrument equipped with a field emission gun, 3 high vacuum electron detectors (Se2, Inlens and RBSD) and a Röntec EDX system. You can obtain excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers.
+The 'old workhorse' SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is a very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves. It is a standard high vacuum instrument equipped with a field emission gun, 3 high vacuum electron detectors (Se2, Inlens and RBSD) and a Röntec EDX system. You can obtain excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers. We prefer that new users that have no prior SEM experience get trained on the Leo SEM before they start using the FEI or Zeiss.
-[[image:SEM-Jeol.jpg|200x200px|right|thumb|The Jeol SEM is located in the basement and is currently not operational]]
+[[image:SEM-FEI-1.jpg|200x200px|right|thumb|The FEI SEM has its own dedicated room: Cleanroom 10]]
-The popularity and need for the [[/Leo|Leo SEM]] is however such that a 'maximum 2 hour per session' policy is necessary  - so it may be difficult to get access to it.
+The [[/FEI|FEI SEM]] has been acquired to cope with the growing need for polymer and e-beam related imaging. It is a state-of-the-art microscope with two vacuum modes (High Vacuum and Low Vacuum) and 7 different detectors, offering unsurpassed resolution on any type of sample or material. This great performance, however, requires a skilled operator that knows how to achieve it. Also, we have learned that the high degree of sophistication and the great number of detectors make it much less robust compared to the two other SEM's. It is therefore the intention that only users with special needs that will be trained. Furthermore, the instrument is equipped with a Oxford Inca EDX system and a Kleindiek micromanipulator with a Capres 4 point probe.
-Note! The [[/Jeol|Jeol SEM]] is currently not available.
+[[image:SEM-Jeol.jpg|200x200px|right|thumb|The Jeol SEM is located outside the cleanroom in the basement ]]
+[[/Jeol|Jeol SEM]]
 ''The less advanced [[/Jeol|Jeol SEM]] offers a great alternative for many types of SEM needs. If you have to check the result of an etch process, a lift-off etc. before you proceed with the process sequence, the [[/Jeol|Jeol SEM]] is a much better choice. It is simple, faster to use, has a very low sample exchange time and is by far more accessible than any of the other SEMs. There is a very good chance that it is free when you need it. On heavily charging polymers such as SU-8 it even does a better job than the Leo SEM. To use it, a 1-2 hour training session is necessary.''
-[[image:SEM-FEI-1.jpg|200x200px|right|thumb|The FEI SEM has its own dedicated room: Cleanroom 10]]
 The SEM - Zeiss is the newest SEM.
-The [[/FEI|FEI SEM]] is our most advanced SEM. It has been acquired to cope with the growing need for polymer and e-beam related imaging. It is a state-of-the-art microscope with two vacuum modes (High Vacuum and Low Vacuum) and 7 different detectors, offering unsurpassed resolution on any type of sample or material. This great performance, however, requires a skilled operator that knows how to achieve it. Also, we have learned that the high degree of sophistication and the great number of detectors make it much less robust compared to the two other SEM's. It is therefore intended to be a superuser instrument where a fewer number of users will be trained.
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