Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Difference between revisions
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==Single big box approach== | ==Single big box approach== | ||
In this approach the mask is a single box determining the area of the array. The algorithm that places beam shots will seek to fill the shape as evenly as possible. Hence, the shot placements will not form an equidistant grid unless the size of the shape allows an integer number of beam shots to be placed in both axis. This is is illustrated below. | In this approach the mask is a single box determining the area of the array. The algorithm that places beam shots will seek to fill the shape as evenly as possible. Hence, the shot placements will not form an equidistant grid unless the size of the shape allows an integer number of beam shots to be placed in both axis. This is is illustrated below. | ||
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Example of shot placement. Left: The shot placement does not form an equidistant grid since the beam pitch does not fit an integer number of beam shots in the 4x4 µm subfield. Right: The beam pitch matches the subfield size and beam shots are placed in a perfect grid. | |||
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==Small box approach== | ==Small box approach== | ||