LabAdviser/314/Microscopy 314-307/Technique/Holo/Off-axis ETEM: Difference between revisions
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In order to remove effects from the TEM or other instabilities, reference holograms are usually acquired right after the object holograms. They are later used for reconstruction. | In order to remove effects from the TEM or other instabilities, reference holograms are usually acquired right after the object holograms. They are later used for reconstruction. | ||
[[file:Schematic_holo.jpg|thumb|left|200px|Figure 1: Schematic of the set-up for off-axis electron holography. U0 is the biprism voltage, s is the fringe spacing, β is the angle that the object and reference wave is superimposed onto one another, and w is the width of the interference pattern.]] <br clear=all | :[[file:Schematic_holo.jpg|thumb|left|200px|Figure 1: Schematic of the set-up for off-axis electron holography. U0 is the biprism voltage, s is the fringe spacing, β is the angle that the object and reference wave is superimposed onto one another, and w is the width of the interference pattern.]] <br clear=all> | ||
The detailed procedure for obtaining electron holograms is described below. The procedure has been used for obtaining holograms of in liquid phase transmission electron microscopy or of single features on a C-grid. Some tips are also shown at the end of the document. | The detailed procedure for obtaining electron holograms is described below. The procedure has been used for obtaining holograms of in liquid phase transmission electron microscopy or of single features on a C-grid. Some tips are also shown at the end of the document. | ||