Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions
| Line 47: | Line 47: | ||
=Development= | =Development= | ||
AR-P is developed in AR 600-50 and IPA is used to rinse and stop development. As we have no dedicated setup for this it must be done in beakers in the EBL development fumehood in E4. | AR-P 617 is developed in AR 600-50 and IPA is used to rinse and stop development. As we have no dedicated setup for this it must be done in beakers in the EBL development fumehood in E4. | ||
Typical development time is 60-90 seconds and it is recommended to rinse for 30 seconds in IPA. | Typical development time is 60-90 seconds and it is recommended to rinse for 30 seconds in IPA. | ||