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Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 407: Line 407:
|+  Condition files and beam current
|+  Condition files and beam current
|-
|-
! Beam current !! Aperture !! Condition file
! Typical beam current [nA] !! Aperture !! Condition file
|-
|-
| 0.22 || 4 || 0.22na_ap4
| 0.227 || 4 || 0.22na_ap4
|}
|}
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