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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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1,918 edits
Line 20: Line 20:
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331-2|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331-2|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan332|3.32]]
|-
|-
!Cl<sub>2</sub> (sccm)
!Cl<sub>2</sub> (sccm)
Line 30: Line 31:
|15
|15
|15
|15
|0
|0
|0
|0
|0
Line 42: Line 44:
|5
|5
|0
|0
|5
|5
|5
|5
|5
Line 58: Line 61:
|0
|0
|0
|0
|15
|15
|15
|15
|15
Line 74: Line 78:
|900 F
|900 F
|900 L
|900 L
|900 F
|900 F
|900 F
|900 F
|900 F
Line 90: Line 95:
|75
|75
|75
|75
|30
|-
|-
! Pressure (mtorr)
! Pressure (mtorr)
Line 102: Line 108:
|2
|2
|10
|10
|2
|2
|2
|2
|2
Line 116: Line 123:
| 20
| 20
| 50
| 50
|50
| 50
|50
| 50
| 50
|-
|-
! Spacers (mm)
! Spacers (mm)
Line 132: Line 140:
| 100
| 100
| 30
| 30
| 100
|-
|-
! Process time (s)
! Process time (s)
Line 143: Line 152:
|180
|180
|300
|300
|180
|180
|180
|180
|180
Line 148: Line 158:
|-
|-
! Nominal line width
! Nominal line width
! colspan="13" align="center"| Etched depths (nm)
! colspan="14" align="center"| Etched depths (nm)
|-
|-
! 30 nm
! 30 nm
Line 160: Line 170:
|170
|170
|295
|295
|
|
|
|
|
Line 174: Line 185:
|185
|185
|411
|411
|
|
|
|
|
Line 188: Line 200:
|253
|253
|566
|566
|
|
|
|
|
Line 202: Line 215:
|278
|278
|600
|600
|
|
|
|
|
Line 215: Line 229:
|280
|280
|647
|647
|
|
|
|
|
Line 220: Line 235:
|-
|-
! Nominal line width
! Nominal line width
! colspan="13" align="center"| Etch rates in trenches (nm/min)
! colspan="14" align="center"| Etch rates in trenches (nm/min)
|-
|-
!30 nm
!30 nm
Line 232: Line 247:
|57
|57
|59
|59
|
|
|
|
|
Line 246: Line 262:
|62
|62
|82
|82
|
|
|
|
|
Line 260: Line 277:
|84
|84
|113
|113
|
|
|
|
|
Line 274: Line 292:
|93
|93
|120
|120
|
|
|
|
|
Line 288: Line 307:
|93
|93
|129
|129
|
|
|
|
|
Line 293: Line 313:
|-
|-
|
|
! colspan="13" align="center"| zep mask parameters
! colspan="14" align="center"| zep mask parameters
|-
|-
! start (end)
! start (end)
Line 305: Line 325:
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)]]
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)]]
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep|348 (53)]]
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep|348 (53)]]
|
|
|
|
|
Line 319: Line 340:
| 39
| 39
| 59
| 59
|
|
|
|
|
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher"