Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
Appearance
| Line 236: | Line 236: | ||
! | ! | ||
! 1% HF in RCA Bench | ! 1% HF in RCA Bench | ||
! 1 | ! 1% HF PP-bath | ||
! 1 | ! 1% HF Plastic beaker | ||
|- | |- | ||
| Line 236: | Line 236: | ||
! | ! | ||
! 1% HF in RCA Bench | ! 1% HF in RCA Bench | ||
! 1 | ! 1% HF PP-bath | ||
! 1 | ! 1% HF Plastic beaker | ||
|- | |- | ||