Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/Cassettes: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 65: Line 65:
! Substrate size !! ID !! Slot ID !! Material !! Image !! Position indication !! Approximate offset [µm]
! Substrate size !! ID !! Slot ID !! Material !! Image !! Position indication !! Approximate offset [µm]
|-
|-
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|700px]] || [[image:BM4P-509 small.png|300px]]
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|800px]] || [[image:BM4P-509 small.png|300px]]


|| Measured 2024-01-05
|| Measured 2024-01-05
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/Cassettes"