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Specific Process Knowledge/Lithography/EBeamLithography/Cassettes: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 65: Line 65:
! Substrate size !! ID !! Slot ID !! Material !! Image !! Slot center coordinates [µm] !! Approximate offset [µm]
! Substrate size !! ID !! Slot ID !! Material !! Image !! Slot center coordinates [µm] !! Approximate offset [µm]
|-
|-
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|800px]] || 3A: (80.000, 60.000)
| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|800px]] || [[image:BM4P-509 small.png|400px]]
3B: (200.000, 60.000)
 
3C: (80.000, 180.000)
 
3D: (200.000, 180.000)


|| Measured 2024-01-05
|| Measured 2024-01-05
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