Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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[[File:ContrastCurvesCSAR_March2016_log.png|600px]] | [[File:ContrastCurvesCSAR_March2016_log.png|600px]] | ||
==Cross section dose lines== | |||
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Cross section SEM images of 500 nm AR-P 6200.09 exposed at 200-600 µC/cm<sup>2</sup>. Top image is 100 nm lines, center image is 50 nm lines, bottom image is 20 nm lines. Au coated for SEM imaging. | Cross section SEM images of 500 nm AR-P 6200.09 exposed at 200-600 µC/cm<sup>2</sup>. Top image is 100 nm lines, center image is 50 nm lines, bottom image is 20 nm lines. Au coated for SEM imaging. | ||
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| [[image:thope240214_lines180_100_29.png|1200px]] | |||
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| [[image:thope240214_lines180_50_31.png|1200px]] | |||
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| [[image:thope240214_lines180_20_33.png|1200px]] | |||
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| colspan="1" style="text-align:center;| | |||
Cross section SEM images of 180 nm AR-P 6200.09 exposed at 200-600 µC/cm<sup>2</sup>. Top image is 100 nm lines, center image is 50 nm lines, bottom image is 20 nm lines. Au coated for SEM imaging. | |||
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