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Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 73: Line 73:
*2nd development
*2nd development
**Manual development in fumehood 10 - AR 600-50 for 90 sec and 30 sec IPA rinse
**Manual development in fumehood 10 - AR 600-50 for 90 sec and 30 sec IPA rinse
The second development can be further extended to promote additional undercut.
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