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Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
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*Substrate: 2" Si
*Substrate: 2" Si
*Exposure tool: JEOL 9500 at 100 kV
*Exposure tool: JEOL 9500 at 100 kV
*1st layer coating
**Coater: Labspin 2
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