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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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1,918 edits
Line 19: Line 19:
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan37|3.7]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan37|3.7]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331|3.31]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331-2|3.31]]
|-
|-
!Cl<sub>2</sub> (sccm)
!Cl<sub>2</sub> (sccm)
Line 31: Line 32:
|0
|0
|0
|0
|
|
|
|-
|-
Line 44: Line 46:
|5
|5
|5
|5
|
|
|
|-
|-
Line 57: Line 60:
|15
|15
|15
|15
|
|
|
|-
|-
Line 70: Line 74:
|900 F
|900 F
|900 L
|900 L
|
|
|
|-
|-
Line 83: Line 88:
|75
|75
|60
|60
|
|
|
|-
|-
Line 96: Line 102:
|2
|2
|10
|10
|
|
|
|-
|-
Line 109: Line 116:
| 20
| 20
| 50
| 50
|
|
|
|-
|-
Line 122: Line 130:
| 100
| 100
| 100
| 100
|
|
|
|-
|-
Line 135: Line 144:
|300
|300
|180
|180
|
|
|
|-
|-
! Nominal line width
! Nominal line width
! colspan="11" align="center"| Etched depths (nm)
! colspan="13" align="center"| Etched depths (nm)
|-
|-
! 30 nm
! 30 nm
Line 150: Line 160:
|170
|170
|295
|295
|
|
|
|
|
Line 163: Line 174:
|185
|185
|411
|411
|
|
|
|
|
Line 176: Line 188:
|253
|253
|566
|566
|
|
|
|
|
Line 189: Line 202:
|278
|278
|600
|600
|
|
|
|-
|-
Line 201: Line 215:
|280
|280
|647
|647
|
|
|
|
|
|-
|-
! Nominal line width
! Nominal line width
! colspan="11" align="center"| Etch rates in trenches (nm/min)
! colspan="13" align="center"| Etch rates in trenches (nm/min)
|-
|-
!30 nm
!30 nm
Line 217: Line 232:
|57
|57
|59
|59
|
|
|
|
|
Line 230: Line 246:
|62
|62
|82
|82
|
|
|
|
|
Line 243: Line 260:
|84
|84
|113
|113
|
|
|
|
|
Line 256: Line 274:
|93
|93
|120
|120
|
|
|
|
|
Line 269: Line 288:
|93
|93
|129
|129
|
|
|
|
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|-
|-
|
|
! colspan="12" align="center"| zep mask parameters
! colspan="13" align="center"| zep mask parameters
|-
|-
! start (end)
! start (end)
Line 285: Line 305:
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)]]
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)]]
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep|348 (53)]]
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep|348 (53)]]
|
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Line 298: Line 319:
| 39
| 39
| 59
| 59
|
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Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher"