Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions
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=Contrast curve= | =Contrast curve= | ||
A contrast curve for AR-P 617.06 is provided below based on exposure at 100 kV for doses from | A contrast curve for AR-P 617.06 is provided below based on exposure at 100 kV for doses from 5 to 120 µC/cm<sup>2</sup>. The dose clear is dependent on softbake temperature, in this case 200C and 180C is used. Process parameters are: | ||
*Date: February 5th 2024 | *Date: February 5th 2024 | ||