Specific Process Knowledge/Lithography/Coaters/labspin: Difference between revisions
| Line 66: | Line 66: | ||
AZ MiR 701<br> | AZ MiR 701<br> | ||
AZ nLOF 2000 series<br> | AZ nLOF 2000 series<br> | ||
mr-I8100R | mr-I8100R<br> | ||
AZ 15nXT | |||
|Two bowlsets available | |Two bowlsets available | ||
|- | |- | ||
Revision as of 03:48, 11 February 2025
Spin coater: Labspin
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| Spin Coater: Labspin 02 | Spin Coater: Labspin 03 + fumehood 11 |
| Loacted in wetbench 08 in E-5 | Located in wetbench 09 in E-5 |
| LabSpin 6, Süss MicroTec | LabSpin 6, Süss MicroTec |
Training video: LabSpin02 + 03
Process information
Spin curves (LabSpin 6):
More information on resists (incl. spin curves) is available in the resist overview.
Available bowlsets:
| Bowlset name | Component solvent | Cleaning solvent | List of resists | Comments |
|---|---|---|---|---|
| AZ resist | PGMEA/Ethyl Lactate | Acetone |
AZ 5214E |
Two bowlsets available |
| CSAR/ZEP/mrEBL/PMMA | Anisole | Remover 1165 |
AR-P 6200 series (CSAR 62) |
|
| HSQ/AR-N 8200 | MIBK/PGMEA | Acetone |
HSQ (FOx series) |
|
| OrmoComp/OrmoStamp | Propyl Acetate | Acetone |
OrmoComp |
|
| BCB/CYCLOTENE | Mesitylene | T1100 |
3022-X |
|
| Epoxy/Acrylate | Cyclopentanone/PGMEA | Acetone |
SU-8 2000 series |
|
| AR-P 617/AR-N 7520 | PGME/PGMEA | Acetone | AR-N 7500 series | |
| Polymer Ps-b-PDMS/block copolymer | Heptane | Ethyl Acetate | ||
| DIRTY bowlset | Anything Organic | Use the appropriate cleaning reagent for your resist |
| Purpose | Labspin |
Spin coating of resist ONLY in dedicated bowlsets Please do NOT use substances which is not for the dedicated bowlsets |
|---|---|---|
| All purpose |
Spin coating of dirty substances in All purpose
| |
| Process parameters | Spin speed |
|
| Spin acceleration |
| |
| Substrates | Substrate size |
|
| Allowed materials |
All cleanroom materials Please ONLY use substances which is for the dedicated bowlsets in labspins | |
| Batch |
1 |