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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,319 edits
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{| border="2" cellspacing="2" cellpadding="3"  
{| border="2" cellspacing="2" cellpadding="3"  
!Recipe settings
!Recipe settings
!Comments
!SEM gallery
!SEM gallery
|-
|-
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
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|text
<gallery caption="SiO2 etch with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">


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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch" perrow="6" widths="200px" heights="150px">


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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
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|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm" perrow="6" widths="200px" heights="150px">
File:C10025_03__11.jpg
File:C10025_03__11.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, O2:5sccm" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, O2:5sccm" perrow="6" widths="200px" heights="150px">
File:C10026_03__05.jpg
File:C10026_03__05.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
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|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:225sccm, Pressure:3.35mTorr" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:225sccm, Pressure:3.35mTorr" perrow="6" widths="200px" heights="150px">
File:C10082_11.jpg
File:C10082_11.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:225sccm, Pressure:3.35mTorr; platen power 150W, coil power:1200W" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:225sccm, Pressure:3.35mTorr; platen power 150W, coil power:1200W" perrow="6" widths="200px" heights="150px">
File:C10084_15.jpg
File:C10084_15.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:215sccm O2:10sccm, Pressure:3.6mTorr; platen power 150W, coil power:1200W" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:215sccm O2:10sccm, Pressure:3.6mTorr; platen power 150W, coil power:1200W" perrow="6" widths="200px" heights="150px">
File:C10093_03__11.jpg
File:C10093_03__11.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 150W, coil power:1200W" perrow="7" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 150W, coil power:1200W" perrow="7" widths="200px" heights="150px">
File:C10101_03__12.jpg
File:C10101_03__12.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:215sccm O2:10sccm, Pressure:3.6mTorr; platen power 150W, coil power:1800W" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:215sccm O2:10sccm, Pressure:3.6mTorr; platen power 150W, coil power:1800W" perrow="6" widths="200px" heights="150px">
File:C10102_03__05.jpg
File:C10102_03__05.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 150W, coil power:1800W" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 150W, coil power:1800W" perrow="6" widths="200px" heights="150px">
File:C10110_04.jpg
File:C10110_04.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN  
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN  
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 100W, coil power:1200W" perrow="7" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 6 min etch, H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 100W, coil power:1200W" perrow="7" widths="200px" heights="150px">
File:C10119_01.jpg
File:C10119_01.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN  
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN  
|
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|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier '''14 min etch''' (PLEASE DO NOT REPEAT THIS LONG TIME), H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 100W, coil power:1200W" perrow="7" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier '''14 min etch''' (PLEASE DO NOT REPEAT THIS LONG TIME), H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 100W, coil power:1200W" perrow="7" widths="200px" heights="150px">
File:C10160_02.jpg
File:C10160_02.jpg
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*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN  
*PLEASE DO NOT RUN WITH THESE SETTINGS FOR MORE THAN 6 MIN  
|
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|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier '''10 min etch''', H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 150W, coil power:1800W" perrow="6" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier '''10 min etch''', H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.6mTorr; platen power 150W, coil power:1800W" perrow="6" widths="200px" heights="150px">
File:C10161_01.jpg
File:C10161_01.jpg
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*'''Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A''''  
*'''Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A''''  
|
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|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.9mTorr; platen power 100W, coil power:1200W" perrow="7" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.9mTorr; platen power 100W, coil power:1200W" perrow="7" widths="200px" heights="150px">
File:C10184_01.jpg
File:C10184_01.jpg
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*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.9mTorr; platen power 100W, coil power:2500W" perrow="7" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.9mTorr; platen power 100W, coil power:2500W" perrow="7" widths="200px" heights="150px">
File:C10381_04.jpg
File:C10381_04.jpg
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*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:225sccm O2:0sccm, Pressure:3.9mTorr; platen power 200W, coil power:2500W" perrow="7" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:225sccm O2:0sccm, Pressure:3.9mTorr; platen power 200W, coil power:2500W" perrow="7" widths="200px" heights="150px">
File:C10393_04.jpg
File:C10393_04.jpg
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*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.9mTorr; platen power 200W, coil power:2500W" perrow="7" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0 H2:0sccm, C4F8:13sccm He:205sccm O2:20sccm, Pressure:3.9mTorr; platen power 200W, coil power:2500W" perrow="7" widths="200px" heights="150px">
File:C10399_01.jpg
File:C10399_01.jpg
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*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
|
|
|text
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0" perrow="7" widths="200px" heights="150px">
<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0" perrow="7" widths="200px" heights="150px">
File:C10576_02.jpg
File:C10576_02.jpg
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*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
|
|
|text
<gallery caption=" C10751: SiO2 etch with Cr mask on wafer piece on Si carrier 20 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 50W, coil power:600W" perrow="7" widths="200px" heights="150px">
<gallery caption=" C10751: SiO2 etch with Cr mask on wafer piece on Si carrier 20 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 50W, coil power:600W" perrow="7" widths="200px" heights="150px">
File:C10751_02.jpg
File:C10751_02.jpg
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*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
|
|
|text
<gallery caption=" C10752: SiO2 etch with Cr mask on wafer piece on Si carrier 30 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 25W, coil power:300W" perrow="6" widths="200px" heights="150px">
<gallery caption=" C10752: SiO2 etch with Cr mask on wafer piece on Si carrier 30 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 25W, coil power:300W" perrow="6" widths="200px" heights="150px">
File:C10752_01.jpg
File:C10752_01.jpg
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*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
|
|
|text
<gallery caption=" C10834: SiO2 etch with Cr mask on wafer piece on Si carrier 45 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 25W, coil power:300W" perrow="6" widths="200px" heights="150px">
<gallery caption=" C10834: SiO2 etch with Cr mask on wafer piece on Si carrier 45 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 25W, coil power:300W" perrow="6" widths="200px" heights="150px">
File:C10834_12.jpg
File:C10834_12.jpg
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*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
*Electromagnetic coils (EM) 'outer coil' / 'inner coil':'0 A' / '0 A'  
|
|
|text
<gallery caption=" C10844: SiO2 etch with Cr mask on wafer piece on Si carrier 50 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 20W, coil power:300W" perrow="6" widths="200px" heights="150px">
<gallery caption=" C10844: SiO2 etch with Cr mask on wafer piece on Si carrier 50 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 20W, coil power:300W" perrow="6" widths="200px" heights="150px">
File:C10844_02.jpg
File:C10844_02.jpg
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