Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
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File:C010082top_07.jpg | |||
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</gallery> | </gallery> | ||
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File:Contour Plot Y33 EM_0_0 blue to red.jpg| Etch on none patterned wafer, Uniformity: +-1.7% | File:Contour Plot Y33 EM_0_0 blue to red.jpg| Etch on none patterned wafer, Uniformity: +-1.7% | ||
File:C010184top_01.jpg | |||
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File:C010184tilt30plasmaO2_02.jpg| tilt 30 degrees | |||
File:C010184tilt30plasmaO2_01.jpg| tilt 30 degrees | |||
File:C010184tilt20plasmaO2_07.jpg| tilt 20 degrees | |||
File:C010184tilt20plasmaO2_05.jpg| tilt 20 degrees | |||
</gallery> | </gallery> | ||
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