Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
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|[[media:AR-N7500-7520.pdf|AR-N7500-7520]] | |[[media:AR-N7500-7520.pdf|AR-N7500-7520]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | ||
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|PGMEA | |PGMEA | ||
|AR 300-47, TMAH | |AR 300-47, TMAH | ||
|H2O | |H2O | ||
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