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== Substrate preparation ==
== Substrate preparation ==
Substrates must be prepared for EBL by applying an e-beam sensitive resist and possibly a discharge layer. Please consult the [[Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep| EBL substrate preparation guide]] on how to prepare your substrate and resist information.
Substrates must be prepared for EBL by applying an e-beam sensitive resist and possibly a discharge layer. Please consult the EBL substrate preparation guide on how to prepare your substrate and to find resist information.
 
[[Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep| EBL substrate preparation guide]]


== Pattern preparation ==
== Pattern preparation ==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography"