Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
| Line 263: | Line 263: | ||
</gallery> | </gallery> | ||
<gallery caption=" C10752: SiO2 etch with Cr mask on wafer piece on Si carrier | <gallery caption=" C10752: SiO2 etch with Cr mask on wafer piece on Si carrier 30 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 25W, coil power:300W" perrow="6" widths="200px" heights="150px"> | ||
File:C10752_09.jpg | File:C10752_09.jpg | ||
File:C10752_07.jpg | File:C10752_07.jpg | ||
| Line 270: | Line 270: | ||
File:C10752_01.jpg | File:C10752_01.jpg | ||
File:C10752_10.jpg | File:C10752_10.jpg | ||
</gallery> | |||
<gallery caption=" C10834: SiO2 etch with Cr mask on wafer piece on Si carrier 45 min etch, EM:0/0 H2:0sccm, C4F8:6.5sccm He:100sccm O2:10sccm, Pressure:?mTorr; platen power 25W, coil power:300W" perrow="6" widths="200px" heights="150px"> | |||
File:C10834T_17.jpg | File:C10834T_17.jpg | ||
File:C10834T_15.jpg | File:C10834T_15.jpg | ||
| Line 286: | Line 289: | ||
File:C10844_13.jpg | File:C10844_13.jpg | ||
</gallery> | </gallery> | ||
===Profile, top view at tilted SEM images on 800 nm pitch and 50% duty cycle ( look at the Cr mask in top of the page=== | ===Profile, top view at tilted SEM images on 800 nm pitch and 50% duty cycle ( look at the Cr mask in top of the page=== | ||