Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3/SiO2 etch: Difference between revisions

Bghe (talk | contribs)
No edit summary
Bghe (talk | contribs)
Line 33: Line 33:
! SiO2 etch rate uniformity !! SiO2 etch rate uniformity normalized to center!! Si Etch rate uniformity
! SiO2 etch rate uniformity !! SiO2 etch rate uniformity normalized to center!! Si Etch rate uniformity
|-
|-
| [[File:Peg3 SiO2 uniformity Y34 to Y40.jpg]] || [[File:Peg3 SiO2 uniformity normalized Y34 to Y40.jpg]] || [[File:Peg3 Si etch uniformity Y38 and Y40.jpg]]
| [[File:Peg3 SiO2 uniformity Y34 to Y40.jpg]] || [[File:Peg3 SiO2 uniformity normalized Y34 to Y40.jpg]] || valign="top"| [[File:Peg3 Si etch uniformity Y38 and Y40.jpg]]
|}
|}