Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3/SiO2 etch: Difference between revisions

@@ Line 21: / Line 21: @@
 | Y37 ||25 sccm|| 75 sccm|| 0 sccm|| 100 W || 40 mTorr
 |-
-| Y38 || Example || Example || Example || Example || Example
+| Y38 || 25 sccm|| 75 sccm|| 0 sccm|| 100 W || 60 mTorr
 |-
-| Y39 || Example || Example || Example || Example || Example
+| Y39 ||  50 sccm|| 150 sccm|| 0 sccm|| 100 W || 10 mTorr
 |-
-| Y40 || Example || Example || Example || Example || Example
+| Y40 ||  8.33 sccm|| 50 sccm|| 100 sccm|| 100 W || 10 mTorr
 |}
 [[File:Peg3 SIO2 uniformity - Contour Plot 5.jpg|400px]]