Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3/SiO2 etch: Difference between revisions
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! Wafer number !! C4F8 !! SF6 flow !! Ar !! Coil power !! Platen power !! Presure | ! Wafer number !! C4F8 !! SF6 flow !! Ar !! Coil power !! Platen power !! Presure | ||
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[[File:Peg3 SIO2 uniformity - Contour Plot 5.jpg|400px]] | [[File:Peg3 SIO2 uniformity - Contour Plot 5.jpg|400px]] | ||