Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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''All contents by DTU Nanolab staff.'' | ''All contents by DTU Nanolab staff.'' | ||
Deposition of Silicon Oxide can be done with either LPCVD, PECVD, by sputtering, by e-beam evaporation | Deposition of Silicon Oxide can be done with either LPCVD, PECVD, by sputtering, or by e-beam evaporation. It is also possible to grow silicon oxide using a silicon surface as a starting point. This can be done with wet chemistry in a beaker (see below), or as a [[Specific Process Knowledge/Thermal Process/Oxidation|thermal oxide]] in a hot furnace. | ||
==Deposition of Silicon Oxide using LPCVD== | ==Deposition of Silicon Oxide using LPCVD== | ||
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Formerly we also had the option to sputter silicon oxide using the [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE Ionfab300]]. You can read more about that [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2|here]]. | Formerly we also had the option to sputter silicon oxide using the [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE Ionfab300]]. You can read more about that [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2|here]]. | ||
==Deposition of Silicon Oxide using e-beam evaporation== | ==Deposition of Silicon Oxide using e-beam evaporation== | ||
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'''Training and risk assessment always needed''' | '''Training and risk assessment always needed''' | ||
==Deposition of Silicon Oxide using ALD== | |||
Formerly it was possible to deposit thin films of silicon oxide up to 50 nm in the [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)|ALD2]]. This is unfortunately no longer possible. You can read about the results of depositions in the past here: [[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/SiO2 deposition using ALD2|Deposition of Silicon Oxide using ALD2]]. | |||
==Comparison of the methods for deposition of Silicon Oxide== | ==Comparison of the methods for deposition of Silicon Oxide== | ||