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==Deposition of Silicon using e-beam evaporation==
==Deposition of Silicon using e-beam evaporation==
It is possible to e-beam evaporate silicon at Nanolab using the [[Specific Process Knowledge/Thin film deposition/10-pocket e-beam evaporator|E-beam evaporator (10-pockets)]]). As with sputtering you can deposit on almost any material, and in the case of e-beam evaporation the deposition is line-of-sight and will be suitable for lift-off. However for 8" wafers the system is not optimized for lift-off on the full diameter of the wafer.
It is possible to e-beam evaporate silicon at Nanolab using the [[Specific Process Knowledge/Thin film deposition/10-pocket e-beam evaporator|E-beam evaporator (10-pockets)]]. As with sputtering you can deposit on almost any material, and in the case of e-beam evaporation the deposition is line-of-sight and will be suitable for lift-off. However for 8" wafers the system is not optimized for lift-off on the full diameter of the wafer.


==Comparison of the methods for deposition of Silicon==
==Comparison of the methods for deposition of Silicon==
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