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==Deposition of Silicon using sputter deposition==
==Deposition of Silicon using sputter deposition==


At Nanolab you can also deposit silicon the using Wordentec, the Lesker Sputter systems or the IBE Ionfab300 sputter systems. One of the advantages here is that you can deposit on any material you like.  
At Nanolab you can sputter silicon the using Wordentec or the Lesker Sputter systems. One of the advantages here is that you can deposit on almost any material you like.  


* [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBSD of Si|Si deposition in IBE⁄IBSD Ionfab300]]
* [[Specific Process Knowledge/Thin film deposition/Si sputter in Wordentec|Si sputter deposition in the Wordentec]]
* [[Specific Process Knowledge/Thin film deposition/Si sputter in Wordentec|Si sputter deposition in the Wordentec]]
* [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Lesker|Si sputter deposition in the  Sputter-System (Lesker)]] - ''includes information on surface roughness and stress''
* [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Lesker|Si sputter deposition in the  Sputter-System (Lesker)]] - ''includes information on surface roughness and stress''
* [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Metal-Oxide(PC1)|Si sputter deposition in the  Sputter-System Metal-Oxide(PC1)]]
* [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Metal-Oxide(PC1)|Si sputter deposition in the  Sputter-System Metal-Oxide(PC1)]]
* [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Metal-Oxide(PC3)|Si sputter deposition in the  Sputter-System Metal-Oxide(PC3)]]
* [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Metal-Oxide(PC3)|Si sputter deposition in the  Sputter-System Metal-Oxide(PC3)]]
Historical note: It was previosly possible to sputter Si with our [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300| IonFab 300]]. You can read about the deposition conditions and results from that [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBSD of Si|here]].


==Deposition of Silicon using PECVD==
==Deposition of Silicon using PECVD==
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Historical note: It was previosly possible to deposit Si with our [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300| IonFab 300]]. You can read about the deposition conditions and results from that [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBSD of Si|here]].
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