Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
Appearance
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!style="background:silver; color:black;" align="left"|Purpose | !style="background:silver; color:black;" align="left"|Purpose | ||
|style="background:LightGrey; color:black"|Deposition of various materials ||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Deposition of various materials ||style="background:WhiteSmoke; color:black"| | ||
*Sputtering of metals including alloys and magnetic metals | * Sputtering of metals including: | ||
* alloys and magnetic metals | |||
* semiconductors including silicon | |||
* dielectrica including silica and alumina. | |||
* See tables above and ask staff if there is a material you would like to deposit which you do not see listed. | |||
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!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance | !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance | ||