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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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Bureaucrats, danchip, Administrators
1,918 edits
Line 17: Line 17:
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano36|Sinano3.6]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano36|Sinano3.6]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan33-2|Sinano3.3]]
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan33-2|Sinano3.3]]
|-
![[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan37|Sinano3.7]]
!Tool
|ICP Metal
|ICP Metal
|ICP Metal
|ICP Metal
|ICP Metal
|ICP Metal
|ICP Metal
|ICP Metal
|ICP Metal
|-
|-
!Cl<sub>2</sub> (sccm)
!Cl<sub>2</sub> (sccm)
Line 39: Line 29:
|15
|15
|0
|0
|
|-
|-
!BCl<sub>3</sub> (sccm)
!BCl<sub>3</sub> (sccm)
Line 50: Line 41:
|5
|5
|5
|5
|
|-
|-
!HBr (sccm)
!HBr (sccm)
Line 61: Line 53:
|0
|0
|15
|15
|
|-
|-
! Coil power (W)
! Coil power (W)
Line 72: Line 65:
|900 (Forward)
|900 (Forward)
|900 (Forward)
|900 (Forward)
|
|-
|-
!Platen power (W)
!Platen power (W)
Line 83: Line 77:
|60
|60
|75
|75
|
|-
|-
! Pressure (mtorr)
! Pressure (mtorr)
Line 94: Line 89:
|10
|10
|2
|2
|
|-
|-
|-
|-
Line 106: Line 102:
|180
|180
|300
|300
|
|-
|-
! Nominal line width
! Nominal line width
! colspan="9" align="center"| Etched depths (nm)
! colspan="10" align="center"| Etched depths (nm)
|-
|-
! 30 nm
! 30 nm
Line 120: Line 117:
|170
|170
|295
|295
|
|-
|-
!60 nm
!60 nm
Line 131: Line 129:
|185
|185
|411
|411
|
|-
|-
!90 nm
!90 nm
Line 142: Line 141:
|253
|253
|566
|566
|
|-
|-
!120 nm
!120 nm
Line 164: Line 164:
|280
|280
|647
|647
|
|-
|-
! Nominal line width
! Nominal line width
! colspan="9" align="center"| Etch rates in trenches (nm/min)
! colspan="10" align="center"| Etch rates in trenches (nm/min)
|-
|-
!30 nm
!30 nm
Line 178: Line 179:
|57
|57
|59
|59
|
|-
|-
!60 nm
!60 nm
Line 189: Line 191:
|62
|62
|82
|82
|
|-
|-
!90 nm
!90 nm
Line 200: Line 203:
|84
|84
|113
|113
|
|-
|-
!120 nm
!120 nm
Line 211: Line 215:
|93
|93
|120
|120
|
|-
|-
!150 nm
!150 nm
Line 222: Line 227:
|93
|93
|129
|129
|
|-
|-
|
|
! colspan="9" align="center"| zep mask parameters
! colspan="10" align="center"| zep mask parameters
|-
|-
! start (end)
! start (end)
Line 234: Line 240:
| 110 (43)
| 110 (43)
| 110 (34)
| 110 (34)
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)]]
]]
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep|348 (53)]]
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep|348 (53)
|
]]
|-
|-
! zep etch rate (nm/min)
! zep etch rate (nm/min)
|18
|18
Line 251: Line 254:
|39
|39
|59
|59
|
|-
|-
|}
|}
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