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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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! colspan="9" align="center"| zep mask parameters
! colspan="9" align="center"| zep mask parameters
|-
|-
! Thickness
! start (end)
| 110
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep|110 (64) ]]
| 178
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|178 (96)]]
| 180
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (110)]]
| 180
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)]]
| 180
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (72)]]
| 110
| 110 (43)
| 110
| 110 (34)
| 180
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)
| 348
]]
| [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|348 (53)
]]
|-
|-
! zep etch rate (nm/min)
! zep etch rate (nm/min)
|18
|18
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