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Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions

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!Recipe
!Recipe
!nano1.0
!nano1.0
!nano1.1
!nano1.2
!nano1.3
|-
|-
!Tool
!Tool
|Pegasus
|Pegasus
|Pegasus
|Pegasus
|Pegasus
|-
|-
!C<sub>4</sub>F<sub>8</sub> (sccm)
!C<sub>4</sub>F<sub>8</sub> (sccm)
|52
|52
|52
|52
|52
|-
|-
!SF<sub>6</sub> (sccm)
!SF<sub>6</sub> (sccm)
|38
|38
|38
|38
|38
|-
|-
!O<sub>2</sub> (sccm)
!O<sub>2</sub> (sccm)
|0
|0
|0
|0
|0
|-
|-
! Coil power (W)
! Coil power (W)
|800 (forward)
|800 (forward)
|600 (forward)
|800 (forward)
|600 (forward)
|-
|-
!Platen power (W)
!Platen power (W)
|50
|50
|50
|50
|40
|-
|-
! Pressure (mtorr)
! Pressure (mtorr)
|4
|4
|4
|4
|4
|-
|-
! Process time (s)
! Process time (s)
|120
|120
|120
|120
|120
|-
|-
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! 30 nm
! 30 nm
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!60 nm
!60 nm
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|-
!90 nm
!90 nm
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|-
!120 nm
!120 nm
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!150 nm
!150 nm
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! Nominal line width
! Nominal line width
! colspan="3" align="center"| Etch rates in trenches (nm/min)
! colspan="4" align="center"| Etch rates in trenches (nm/min)
|-
|-
!30 nm
!30 nm
|
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|-
!60 nm
!60 nm
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|-
!90 nm
!90 nm
|
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|-
!120 nm
!120 nm
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!150 nm
!150 nm
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! colspan="3" align="center"| Etch rates in zep resist (nm/min)
! colspan="4" align="center"| Etch rates in zep resist (nm/min)
|-
|-
! One point on wafer
! One point on wafer
|
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|-
! Images
! Images
![[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10|Images]]
|-
|-
|}
|}