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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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Bureaucrats, danchip, Administrators
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Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
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! Nominal line width
! Nominal line width
! colspan="8" align="center"| Etched depths (nm)
! colspan="9" align="center"| Etched depths (nm)
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! 30 nm
! 30 nm
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! Nominal line width
! Nominal line width
! colspan="8" align="center"| Etch rates in trenches (nm/min)
! colspan="9" align="center"| Etch rates in trenches (nm/min)
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!30 nm
!30 nm
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! colspan="8" align="center"| Etch rates in zep resist (nm/min)
! colspan="9" align="center"| Etch rates in zep resist (nm/min)
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! One point on wafer
! One point on wafer
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