Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10: Difference between revisions

Revision as of 10:28, 28 March 2011

The nano1.0 recipe

**Recipe nano1.0**
Recipe	Gas	C₄F₈ 38 sccm, SF₆ 52 sccm
	Pressure	4 mTorr, Strike 3 secs @ 15 mTorr
	Power	800 W CP, 50 W PP
	Temperature	10 degs
	Hardware	100 mm Spacers
	Time	120 secs
Conditions	Run ID	417, 418 and 419
	Conditioning	Sequence: Oxygen clean, MU tests, processes, no oxygen between runs
	Mask	1dfhj10 nm zep etched down to 6dgh4 nm

The results of the nano1.0 recipe
The 30 nm trenches
The 60 nm trenches

The 60 nm trenches
The 90 nm trenches

The 90 nm trenches
The 120 nm trenches

The 120 nm trenches
The 150 nm trenches

The 150 nm trenches
File:C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, 10 degs, 120 secs

@@ Line 6: / Line 6: @@
 ! rowspan="6" align="center"| Recipe
 | Gas
-| C<sub>4</sub>F<sub>8</sub> 38 sccm, HBr 15 sccm
+| C<sub>4</sub>F<sub>8</sub> 38 sccm, SF<sub>6</sub> 52 sccm
 |-
 | Pressure
-| 2 mTorr, Strike 3 secs @ 5 mTorr
+| 4 mTorr, Strike 3 secs @ 15 mTorr
 |-
 | Power
-| 900 W CP, 50 W PP
+| 800 W CP, 50 W PP
 |-
 | Temperature
-| 20 degs
+| 10 degs
 |-
 | Hardware
@@ Line 21: / Line 21: @@
 |-
 | Time
-| 150 secs
+| 120 secs
 |-
 ! rowspan="3" align="center"| Conditions
@@ Line 31: / Line 31: @@
 |-
 | Mask
-| 110 nm zep etched down to 64 nm
+| 1dfhj10 nm zep etched down to 6dgh4 nm
 |-
 |}
-<gallery caption="The results of the Sinano3.0 recipe" widths="250" heights="200" perrow="3">
+<gallery caption="The results of the nano1.0 recipe" widths="250" heights="200" perrow="3">
-image:WF_2A4_feb06_2011-030.jpg|The 30 nm trenches
+image:WF_2C5_feb2011_030.jpg|The 30 nm trenches
-image:WF_2A4_feb06_2011-060.jpg|The 60 nm trenches
+image:WF_2C5_feb2011-060.jpg|The 60 nm trenches
-image:WF_2A4_feb06_2011-090.jpg|The 90 nm trenches
+image:WF_2C5_feb2011-090.jpg|The 90 nm trenches
-image:WF_2A4_feb06_2011-120.jpg|The 120 nm trenches
+image:WF_2C5_feb2011-120.jpg|The 120 nm trenches
-image:WF_2A4_feb06_2011-150.jpg|The 150 nm trenches
+image:WF_2C5_feb2011-150.jpg|The 150 nm trenches
-BCl3 5 sccm, HBr 15 sccm, 2 mTorr, Strike 3 secs @ 5 mTorr, 900 W CP, 50 W PP, 20 degs, 180 secs
+C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, 10 degs, 120 secs
 </gallery>