Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
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<gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 12 min etch, EM:0/0" perrow="7" widths="200px" heights="150px"> | |||
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