Specific Process Knowledge/Characterization/XRD: Difference between revisions
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==Experiments performed with XRD== | ==Experiments performed with XRD== | ||
*[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] | *[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] Note mostly relevant for XRD Smartlab | ||
==Data analysis== | ==Data analysis== |
Revision as of 16:10, 18 December 2023
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Unless otherwise stated, this page is written by DTU Nanolab internal
XRD at DTU Nanolab
We have two X-ray diffraction setups in building 346:
- The XRD SmartLab primarily for thin film analysis inside the cleanroom.
- The XRD Powder for phase analysis of powders outside the cleanroom.
Experiments performed with XRD
- List and description of possible XRD measurements with typical setup requirements Note mostly relevant for XRD Smartlab
Data analysis
For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. If more advanced powder analysis is needed we provide access to a remote desktop with a licence for the excellent Malvern Panalytical software, HighScore.
- Installing SmartLab Studio II
- Converting data from XRD Powder to SmartLab Studio II
- Guide for using SmartLab Studio II for data analysis
- Guide for using HighScore Plus for advanced powder data analysis
Apart from this commercial software a wide range of free software is available online for data analysis. Here are some suggestions from MIT.
Comparison of the XRDs at Nanolab
Equipment | XRD SmartLab | XRD Powder | |
---|---|---|---|
Purpose | Crystal structure analysis
and thin film thickness measurement |
|
|
X-ray generator |
Maximum rated output |
3 kW |
600 W |
Rated tube voltage |
20 to 45 kV |
40 kV | |
Rated tube current |
2 to 60 mA |
15 mA | |
Type |
Sealed tube |
Sealed tube | |
Target |
Cu |
Cu | |
Focus size |
0.4 mm x 8 mm (Line/Point) |
0.4 mm x 12 mm (Line) | |
Goniometer |
Scanning mode |
incident / receiver coupled or independent |
incident / receiver coupled |
Goniomenter radius |
300 mm |
145 mm | |
Minimum step size |
0.0001° (0.36") |
0.001° (3.6") | |
Sample stage motion |
|
Fixed with rotation | |
Optics | Incident side |
|
|
Receiver side |
|
| |
Substrates | Measurement temperature |
Room temperature |
May be heated in N2 up to 500°C |
Substrate size |
up to 150 mm wafers Thickness max 21 mm |
Only for powders | |
Allowed materials |
All materials approved in the cleanroom. No powders or dusty materials. |
All materials have to be approved |