Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 49: | Line 49: | ||
|[mailto:thope@dtu.dk Thomas Pedersen] | |[mailto:thope@dtu.dk Thomas Pedersen] | ||
JEOL 9500 & Raith E-Line | JEOL 9500 & Raith E-Line | ||
|| Peixiong Shi | || [mailto:pxshi@dtu.dk Peixiong Shi] | ||
JEOL 9500 | JEOL 9500 | ||
|| Elena Lopez Aymerich | || [mailto:elelop@dtu.dk Elena Lopez Aymerich] | ||
JEOL 9500 | JEOL 9500 | ||
|| Meena Dhankhar | || [mailto:meenadh@dtu.dk Meena Dhankhar] | ||
Raith E-Line | Raith E-Line | ||
|} | |} | ||